This is the last collage project of the semester.
Using the design of your masking device(s) as a point of departure, create a collage on a board (quarter inch or thereabouts) that is no smaller than 10" x 10".
No faces; people; logos; branding; or any other recognizable objects should comprise your collage materials. Space is implied by color, texture, a careful choice of materials, etched lines, and raster cut areas,
Let's imagine the great Swiss-German painter Paul Klee was in our class:
Paul Klee (pronounced "Clay") was a Bauhaus schooled artist who explored Cubism, Expressionism, and Surrealism in his paintings. He is known for his whimsy (at times), his lectures and writings on form and design, and his knowledge of color theory. His book, The Paul Klee Notebooks, is held in high esteem by scholars of modern art. When money was tight, Klee worked as an illustrator.
Here is a painting by Paul Klee:
In an effort to reverse engineer this, I have I taken the liberty to crop the painting to fit the proportions of our Holga devices:
Let's further imagine that Paul Klee used his study sketches for Dream City to design and cut this masking device on the laser cutter:
Your challenge is to look at the design of your masking device(s) AND the photographs you took with it/them, scale it to the size you are going to make C4, and render in collage some hybrid of masking device and photograph. This should not be a literal interpretation of the photographic image but rather a further abstracted composition of an already abstract image. In other words, assignment "H3_Portraits with Masking Device and Multiple Exposure" should be referenced in shape/form, lights/darks only.
If you shot with two masking devices, they can be merged from a square format to a landscape format, for example. Or, you can eliminate one entirely if it suits your process.
If you look closely at Dream City, you will see shapes that radiate from a central, core shape, almost like a halo-effect. Sometimes the "halo" reverses and collapses into a core shape. These are the kind of lines you should use when you etch into your collage. Using the scale tool to expand and reduce your masking device cut file (or a variation thereof) this type of push and pull of line should be easy to manipulate. Use the etched line to overlay and overlap.
Raster etches will be recommended as needed.
11/5 - first iteration look/see
11/19 - second iteration look/see
12/4 - final due, last class